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Dense Yttria Film Deposited on a Plasma-Sprayed Al₂O₃ Coating by Aerosol Deposition

B.-K. Lee, J.-H. Jung, B.-D. Hahn, W.-H. Yoon, D.-S. Park, J.-J. Choi, J. Ryu, J.-W. Kim, C. Ahn, K.-M. Song

Journal of Ceramic Science and Technology, Vol. 2, No. 4 (2011), pp. 197-202

DOI: 10.4416/JCST2011-00026

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Abstract

Dense yttria (Y2O3) film was deposited on a plasma-sprayed alumina (Al2O3) surface by means of aerosol deposition (AD). The average surface roughness value (Ra) of the plasma-sprayed alumina was varied from 0.3 μm to 4.3 μm by grinding and grit-blasting with fine and coarse alumina abrasives. The ground alumina surface with an Ra value of 0.3 μm was too smooth for deposition of the yttria film by AD. A 30-μm-thick yttria film with 95.3 % TD was successfully deposited on the alumina surfaces with Ra values between 0.5 μm and 1.8 μm. On the other hand, the alumina surfaces with Ra values larger than 2.4 μm exhibited local areas where part of the alumina layer was removed by the grit blasting and microscopically smooth areas were exposed. Deposition of yttria by AD was not accomplished on those local areas. The results suggested that the optimum surface of the plasma-sprayed alumina should be microscopically rough to ensure strong adhesion of the yttria film onto the alumina surface during AD. The yttria film exhibited superior resistance to CF4 + Ar gas plasma erosion compared with the plasma-sprayed alumina coating.

Keywords

Yttria film, alumina, surface roughness, grit blasting, aerosol deposition

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